PVD Technology (Components)

 

The R&D group PVD technology (components) is dedicated to the research and application of PVD coatings for a variety of applications. The main focuses are:

• Power Engineering
• Aeronautical Engineering
• Traffic engineering

Due to the different loads, the coatings have to take over various functions. The research and development of innovative material solutions is carried out within the framework of publicly funded projects and in close cooperation with industry in bilateral projects.

The R&D group PVD technology (components) has access to state-of-the-art technologies for its research work. Thus, the in-house working group can draw on the most common process variants of PVD coating technology. For the development of novel PVD coatings, magnetron sputter ion plating (MSIP), with different chamber volumes, arc ion plating (AIP), high speed (HS) and electron beam (EB) PVD can be used.

In addition to these different PVD processes, the group has access to modern analytical methods. In the development and research of PVD coatings, methods for process analysis, material characterization and testing under application-oriented conditions are used.

Corrosion Protection Coatings

• Corrosion protection coatings for measuring sensors in the aviation industry
• Corrosion protection coatings for high temperature applications
• Corrosion protection coatings for pumps

High-performance tool coatings for primary and forming processes

• Tool coatings for thixoforming and die casting of aluminum (coating system CrAlN)
• Ceramic protective coatings for primary forming and forming processes of steel (coating system γ-Al2O3 and tetragonally stabilized ZrO2) Material and structural developments
• Stabilization of metastable oxidic and nitridic modifications
• High hardness nanocomposite coatings
• Multi- and nanolayer structures for machining and forming processes

High temperature application

• Development of innovative EB-PVD thermal barrier coatings
• Development of diffusion barriers for nickel-base and g-TiAl alloys
• Graded diffusion barriers

Microsystems Technology

• Basic development of parameter windows for the deposition of brazing materials using PVD technology
• Transfer Transient Liquid Phase Joining (TLP) and Soft Active Soldering (WAL) to microsystems
• Identification of suitable microstructures

Plant and process development

• Development of a multi-evaporator and multi-source process based on MSIP and AIP technology
• Integration of pulsed power supplies for MSIP processes
• Use of plasma sources to increase ionization