Pulse synchronized substrate bias for the High Power Pulsed Magnetron Sputtering deposition of CrAlN
Bobzin, Kirsten; Brögelmann, Tobias; Kruppe, Nathan Christopher; Engels, Martin Gottfried; Schulze, Christoph Franz Robert (Corresponding author)
Amsterdam [u.a.] : Elsevier (2021)
Journal Article
In: Thin solid films
Volume: 732
Page(s)/Article-Nr.: 138792
Identifier
- DOI: 10.1016/j.tsf.2021.138792
- RWTH PUBLICATIONS: RWTH-2021-07145