Influence of Ar/Kr ratio and pulse parameters in a Cr-N high power pulse magnetron sputtering process on plasma and coating properties

Bobzin, Kirsten; Bagcivan, Nazlim; TheiƟ, Sebastian; Trieschmann, Jan; Brugnara, Ricardo H. (Corresponding author); Preissing, Sven; Hecimovic, Ante

New York, NY : AIP, American Institute of Physics [u.a.] (2014)
Journal Article

In: Journal of vacuum science & technology / A, Vacuum, surfaces, & films
Volume: 32
Issue: 2
Page(s)/Article-Nr.: 021513

Identifier