Influence of Ar/Kr ratio and pulse parameters in a Cr-N high power pulse magnetron sputtering process on plasma and coating properties

Bobzin, Kirsten; Bagcivan, Nazlim; Theiß, Sebastian; Trieschmann, Jan; Brugnara, Ricardo H. (Corresponding author); Preissing, Sven; Hecimovic, Ante

New York, NY : AIP, American Institute of Physics [u.a.] (2014)
Fachzeitschriftenartikel

In: Journal of vacuum science & technology / A, Vacuum, surfaces, & films
Band: 32
Heft: 2
Seite(n)/Artikel-Nr.: 021513

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