Person
Christoph Schulze
M. Sc.Assistant
Lehrstuhl und Institut für Oberflächentechnik im Maschinenbau
Address
Building: 3024
Room: E 103
Kackertstr. 15
52072 Aachen
Contact
- WorkPhone
- Phone: +49 241 80 99951
Fax
Fax:
+49 241 80 92941
Email:
schulze@iot.rwth-aachen.de
Profile
- 10/2011 - 04/2017 Bachelor degree “Mechanical Engineering”, RWTH Aachen University, focused on: Production Technology
- 04/2017 - 09/2018 Master degree “Production Technology”, RWTH Aachen University, focused on: Surface and Joining Technology
- Since 10/2018 Research assistant at the Surface Engineering Institute
Publications
Source | Author(s) |
---|---|
[Journal Article] Influence of the etching process on the coating performance in dry tribological contacts In: Journal of vacuum science & technology / A, 41 (3), 033104, 13 Seiten, 2023 [DOI: 10.1116/6.0002363] | Bobzin, Kirsten Kalscheuer, Christian Carlet, Marco Schulze, Christoph Franz Robert (Corresponding author) |
[Journal Article] From cathode to substrate : Plasma diagnostics on high power pulsed magnetron sputtering deposition of titanium nitride In: Thin solid films, 755, 139331, 2022 [DOI: 10.1016/j.tsf.2022.139331] | Bobzin, Kirsten Kalscheuer, Christian Carlet, Marco Schulze, Christoph Franz Robert (Corresponding author) |
[Journal Article] Hybrid reactive sputtering of transition metal aluminum oxynitrides In: Thin solid films, 742, 139028, 2021 [DOI: 10.1016/j.tsf.2021.139028] | Bobzin, Kirsten Kalscheuer, Christian Carlet, Marco (Corresponding author) Schulze, Christoph Franz Robert |
[Journal Article] Schneller und günstiger zum Ziel In: Magazin für Oberflächentechnik : mo, 76 (1/2), 32-35, 2022 | Bobzin, Kirsten Kalscheuer, Christian Carlet, Marco Schulze, Christoph Franz Robert |
[Journal Article] Influence of a short reverse positive HPPMS pulse on the deposition of CrAlN In: Surface and coatings technology, 423, 127625, 2021 [DOI: 10.1016/j.surfcoat.2021.127625] | Bobzin, Kirsten Brögelmann, Tobias Kruppe, Nathan Christopher Eichenhofer, G. Schulze, Christoph Franz Robert (Corresponding author) |
[Journal Article] Pulse synchronized substrate bias for the High Power Pulsed Magnetron Sputtering deposition of CrAlN In: Thin solid films, 732, 138792, 2021 [DOI: 10.1016/j.tsf.2021.138792] | Bobzin, Kirsten Brögelmann, Tobias Kruppe, Nathan Christopher Engels, Martin Gottfried Schulze, Christoph Franz Robert (Corresponding author) |