Optical emission spectrometer PLASUS EMICON SA

  Facility and intensity over wavelength diagram Copyright: © IOT PLASUS EMICON SA (left) and an exemplary OES spectrum (right)

The Optical emission spectrometer OES is used to generate wavelength information from a plasma. For this purpose, a visual beam of the plasma is directed via a system of lenses and light guides onto a prism or a slit. At this point, the visual beam is diffracted and thus divided into wavelengths. By recording this spectrum using a CCD camera, the spectrum can subsequently be analysed and processed. The PLASUS EMICON SA, PLASUS GmbH, Mering, Germany, is characterized by a high resolution without moving parts. The OES can record up to six spectra simultaneously. This can be used, to perform simultaneous measurements on different cathodes in a coating chamber. Another application scenario is the measurement at one cathode at different positions or from different viewing directions. This allows spatially resolved measurements to be performed. In addition to plasma monitoring, the OES can also be used for process control.

Technical data:

Parameter Value [Unit]
Detectable wavelength range

200 nm – 1,100 nm

Spectral resolution 1.5 nm
Number of spectrometer channels 6
Connections LAN/Profibus
Inputs for external voltage sensors 6