Leybold Heraeus Z400
As a laboratory system, the magnetron sputtering (MS) facility Leybold Heraeus LH Z400 system makes it possible to develop coating systems and to deposit coatings on compact components. The system is equipped with heating, cooling, vacuum chambers and a direct current (dc), a medium frequency (mf) and a radio frequency (rf) source that allow three targets to be installed simultaneously. With the variety of available target materials and the possibility of using a number of different reactive gases, the LH Z400 supplies film systems for a number of diverse applications.
Technical data
Parameter | Value |
---|---|
Max. component size |
75 x 35 mm² |
Number of Targets |
3 |
Power |
max. P = 1,200/250 W (dc/mf/rf) |
Pulser | max. P = 10 kW, f = 50 - 250 kHz |
Substrate bias | max. U = 150 V |
Heating |
max. T = 700 °C |
Cooling | max. T = -40 °C |