Metaplas Ionon 20''
The Arc-PVD- facility Metaplas Ionon 20“ unit offers numerous possibilities of coating development and conventional coating of small and medium-scale tools and components. The coating unit contains a substrate heater and dc (direct current)/pulse bias sources. It is possible to run 3 arc evaporation sources at the same time or two arc sources and one sputter source. Nearly every metallic target material can be used with or without different process or reactive gases. Today the coating system delivers many different coatings for several technical applications especially to deposit tool coatings, such as coatings for machining and forming applications.
Technical data
| Parameter | Value |
|---|---|
| Arc evaporation sources |
3 (of which 1 steered arc) |
| Sputter source |
1 |
| Plasma Etching technology | Metal Ion Etching (MIE), AEGD (Arc Enhanced Glow Discharge) high ionisation plasma etching |
| Chamber dimensions | diameter/height = 460/530 mm |
| Electrical evaporation energy sources | U = 0 - 60 V; I = 0 - 200 A, dc-Pulsed source: I = 0 - 400 A, with adjustable pulse time from ton = 1 ms to ton = 10,000 ms |
| Substrate bias voltage sources |
dc mode: U = 0 - 1,000 V/ I =10 A, Pulsed mode: f = 0.33 up to f = 33 kHz at U = 0 - 1,000 V |
| Substrate rotation system | velocity: n = 0 - 10 min-1; Load force (axial/radial): 500/200 kg |