PVT 550
The PVT 550 is a coating unit that works close to production using the MS (Magnetron Sputtering) technique. It can be used for coating development as well as for the deposition of coatings on medium-sized components and tools. As such, it bridges the gap between laboratory and industrial systems. The system is equipped with two cathodes which can be operated in dc, rf or pulse mode. The system can be operated in High Power Pulsed Magnetron Sputtering (HPPMS) mode with integrated HPPMS sources by Chemfilt Ionsputtering up to P = 10 kW. This allows both conductive and non-conductive materials to be separated reactively. Through the use of a multi-axis rotating mechanism and a number of different mount designs it is possible to coat complex geometries.
Technical data
| Parameter | Value |
|---|---|
| Chamber volume |
350 x 200 x 200 mm3 |
| 2 cathodes |
can be used in DC, pulsed DC and HPPMS modes |
|
substrate plate |
Rotating |
| dcMS-Pulser | max. P = 6 kW; f = 50 kHz |
| Additional shaft feedthrough | for propulsion of the rotating device |
| Simultaneous control |
of 4 reactive and process gases |
| Plasma source | for low temperature coatings |
| Heating | up to T = 500 °C |